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公開日期標題作者
1-五月-2004Alkylation of nanoporous silica thin films by high density plasma chemical vapor deposition of a-SIC : HPan, FM; Wu, BW; Cho, AT; Tsai, KC; Tsai, TG; Chao, KJ; Chen, JY; Chang, L; 材料科學與工程學系; Department of Materials Science and Engineering
1-一月-2000Annealing effects on the interfacial reactions of Ni on Si0.76Ge0.24 and Si1-x-yGexCyLuo, JS; Lin, WT; Chang, CY; Shih, PS; Pan, FM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十一月-2004Anodic aluminum oxide template assisted growth of vertically aligned carbon nanotube arrays by ECR-CVDChen, PL; Chang, JK; Kuo, CT; Pan, FM; 材料科學與工程學系; Department of Materials Science and Engineering
1996Anomalous selective tungsten growth by chemical vapor depositionMei, YJ; Chang, TC; Sheu, JD; Yeh, WK; Pan, FM; Chang, CY; 交大名義發表; 電子工程學系及電子研究所; National Chiao Tung University; Department of Electronics Engineering and Institute of Electronics
8-一月-1996A bilayer Ti/Ag ohmic contact for highly doped n-type GaN filmsGuo, JD; Lin, CI; Feng, MS; Pan, FM; Chi, GC; Lee, CT; 材料科學與工程學系; 電子工程學系及電子研究所; Department of Materials Science and Engineering; Department of Electronics Engineering and Institute of Electronics
1-十一月-1996Characterization of boron silicide layer deposited by ultrahigh-vacuum chemical-vapor depositionTseng, HC; Pan, FM; Chang, CY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
15-七月-1999Characterization of Si1-x-yGexCy films grown by C+ implantation and subsequent pulsed laser annealingLuo, JS; Lin, WT; Chang, CY; Shih, PS; Pan, FM; Chang, TC; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
31-十月-1997Characterization of TiN film grown by low-pressure-chemical-vapor-depositionMei, YJ; Chang, TC; Hu, JC; Chen, LJ; Yang, YL; Pan, FM; Wu, WF; Ting, A; Chang, CY; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十一月-2001Cu contamination effect in oxynitride gate dielectricsLin, YH; Pan, FM; Liao, YC; Chen, YC; Hsieh, IJ; Chin, A; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十一月-2000The effect of copper on gate oxide integrityLin, YH; Wu, YH; Chin, A; Pan, FM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2006Effect of trimethylsilylation on the film stress of mesoporous silica ultralow-k film stacksChen, JY; Pan, FM; Lin, DX; Cho, AT; Chao, KJ; Chang, L; 材料科學與工程學系; Department of Materials Science and Engineering
1-七月-2002Effective repair to ultra-low-k dielectric material (k-2.0) by hexamethyidisilazane treatmentMor, YS; Chang, TC; Liu, PT; Tsai, TM; Chen, CW; Yan, ST; Chu, CJ; Wu, WF; Pan, FM; Lur, W; Sze, SM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-三月-2002Effective strategy for porous organosilicate to suppress oxygen ashing damageLiu, PT; Chang, TC; Mor, YS; Chen, CW; Tsai, TM; Chu, CJ; Pan, FM; Sze, SM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
20-十月-1997Effects of isolation materials on facet formation for silicon selective epitaxial growthTseng, HC; Chang, CY; Pan, FM; Chen, JR; Chen, LJ; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-六月-1997Effects of isolation oxides on undercut formation and electrical characteristics for silicon selective epitaxial growthTseng, HC; Chang, CY; Pan, FM; Chen, LP; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-六月-1997Effects of isolation oxides on undercut formation and electrical characteristics for silicon selective epitaxial growthTseng, HC; Chang, CY; Pan, FM; Chen, LP; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-七月-1999Effects of morphology and surface characteristics of poly(imide siloxane)s and deep UV/O-3 surface treatment on the interfacial adhesion of poly(imide siloxane)/alloy-42 leadframe jointsJwo, SL; Whang, WT; Hsieh, TE; Pan, FM; Liaw, WC; 材料科學與工程學系; Department of Materials Science and Engineering
1-七月-2002Eliminating dielectric degradation of low-k organosilicate glass by trimethylchlorosilane treatmentChang, TC; Liu, PT; Mor, YS; Tsai, TM; Chen, CW; Mei, YJ; Pan, FM; Wu, WF; Sze, SM; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
2005Emission of bright blue light from mesoporous silica with dense Si (Ge) nanocrystalsCho, AT; Shieh, JM; Shieh, J; Lai, YF; Dai, BT; Pan, FM; Kuo, HC; Lin, YC; Chao, KJ; Liu, PH; 材料科學與工程學系; 光電工程學系; Department of Materials Science and Engineering; Department of Photonics
2005Fabrication and field emission characteristics of highly ordered titanium oxide nanodot arraysChen, PL; Huang, WJ; Chang, JK; Kuo, CT; Pan, FM; 材料科學與工程學系; Department of Materials Science and Engineering
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