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1-二月-19950.35-MU-M PATTERN FABRICATION USING QUARTZ-ETCH ATTENUATE PHASE-SHIFTING MASK IN AN I-LINE STEPPER WITH A 0.50-NA AND A 0.60-SIGMALOONG, WA; SHY, SL; LIN, YC; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1-一月-1994CROSS SHAPED PATTERN ON CHROME MASK FOR 0.5 MU-M CONTACT HOLE FABRICATIONLOONG, WA; SHY, SL; GUO, GC; YANG, MT; SU, SY; 交大名義發表; 應用化學系; National Chiao Tung University; Department of Applied Chemistry
1994SIMULATION AND FABRICATION OF A NEW PHASE-SHIFTING MASK FOR 0.35 MU-M CONTACT HOLE PATTERN TRANSFER - HALF-TONE-RIMLOONG, WA; SHY, SL; GUO, GC; CHOU, YL; 應用化學系; Department of Applied Chemistry
1995SIMULATION STUDY OF A NEW PHASE-SHIFTING MASK - HALFTONE-RIMLOONG, WA; YEH, CH; SHY, SL; 應用化學系; Department of Applied Chemistry
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