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公開日期標題作者
15-十二月-1994COMPARISON OF CHEMICAL-VAPOR-DEPOSITION OF TIN USING TETRAKIS-DIETHYLAMINO-TITANIUM AND TETRAKIS-DIMETHYLAMINO-TITANIUMSUN, SC; TSAI, MH; 交大名義發表; 奈米中心; National Chiao Tung University; Nano Facility Center
1-十月-1995AN EFFICIENT PRECLEAN OF ALUMINIZED SILICON SUBSTRATE FOR CHEMICAL-VAPOR-DEPOSITION OF SUBMICRON TUNGSTEN PLUGSYEH, WK; TSAI, MH; CHEN, SH; CHEN, MC; WANG, PJ; LIU, LM; LIN, MS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-十月-1995AN EFFICIENT PRECLEAN OF ALUMINIZED SILICON SUBSTRATE FOR CHEMICAL-VAPOR-DEPOSITION OF SUBMICRON TUNGSTEN PLUGSYEH, WK; TSAI, MH; CHEN, SH; CHEN, MC; WANG, PJ; LIU, LM; LIN, MS; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
15-一月-1995IMPROVEMENT OF SELECTIVITY DURING DIAMOND GROWTH UTILIZING A NEW PROCESSCHEN, CF; CHEN, SH; HONG, TM; TSAI, MH; 交大名義發表; 材料科學與工程學系; National Chiao Tung University; Department of Materials Science and Engineering
21-八月-1995METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF TANTALUM NITRIDE BY TERTBUTYLIMIDOTRIS(DIETHYLAMIDO)TANTALUM FOR ADVANCED METALLIZATIONTSAI, MH; SUN, SC; CHIU, HT; TSAI, CE; CHUANG, SH; 應用化學系; 電子工程學系及電子研究所; 奈米中心; Department of Applied Chemistry; Department of Electronics Engineering and Institute of Electronics; Nano Facility Center
21-八月-1995METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF TANTALUM NITRIDE BY TERTBUTYLIMIDOTRIS(DIETHYLAMIDO)TANTALUM FOR ADVANCED METALLIZATIONTSAI, MH; SUN, SC; CHIU, HT; TSAI, CE; CHUANG, SH; 應用化學系; 電子工程學系及電子研究所; 奈米中心; Department of Applied Chemistry; Department of Electronics Engineering and Institute of Electronics; Nano Facility Center
顯示 1 到 6 筆資料，總共 6 筆