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公開日期標題作者
1-十一月-2008Anomalous Gate-Edge Leakage Induced by High Tensile Stress in NMOSFETLiu, Po-Tsun; Huang, Chen-Shuo; Lim, Peng-Soon; Lee, Da-Yuan; Tsao, Shueh-Wen; Chen, Chi-Chun; Tao, Hun-Jan; Mii, Yuh-Jier; 光電工程學系; 顯示科技研究所; Department of Photonics; Institute of Display
16-十月-2006Spatial and energetic distribution of border traps in the dual-layer HfO2/SiO2 high-k gate stack by low-frequency capacitance-voltage measurementWu, Wei-Hao; Tsui, Bing-Yue; Chen, Mao-Chieh; Hou, Yong-Tian; Jin, Yin; Tao, Hun-Jan; Chen, Shih-Chang; Liang, Mong-Song; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
1-六月-2007Transient charging and discharging behaviors of border traps in the dual-layer HfO2/SiO2 high-k gate stack observed by using low-frequency charge pumping methodWu, Wei-Hao; Tsui, Bing-Yue; Chen, Mao-Chieh; Hou, Yong-Tian; Jin, Yin; Tao, Hun-Jan; Chen, Shih-Chang; Liang, Mong-Song; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
13-八月-2008Two-dimensional dopant profiling by electrostatic force microscopy using carbon nanotube modified cantileversChin, Shu-Cheng; Chang, Yuan-Chih; Hsu, Chen-Chih; Lin, Wei-Hsiang; Wu, Chih-I; Chang, Chia-Seng; Tsong, Tien T.; Woon, Wei-Yen; Lin, Li-Te; Tao, Hun-Jan; 電子工程學系及電子研究所; Department of Electronics Engineering and Institute of Electronics
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