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收集所有交通大學研究人員與學生個人或團體所發表之各項學術著作,涵蓋期刊論文、教師專書、學位論文等項。;;Collections of Publications of NCTU Researchers and Students Like Journal Papers and Thesis.
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Item type:Item, Effects of high-resistivity, low-temperature layer in transient capacitance measurements of GaAs n-i-p structures(1998-10-15) ;Chen, JF ;Wang, PY ;Chen, NC ;電子物理學系Department of ElectrophysicsDeep-level transient spectroscopy and transient capacitance measurements are performed on a molecular-beam-epitaxially grown GaAs n-i-p diode with a 2000-Angstrom-thick low-temperature OLT)-grown layer immersed in its intrinsic region. The transient capacitance measurements reveal that the time constant and activation energy are the same for both the emission and capture processes. An equivalent circuit based on capacitance-frequency spectra is derived and used to obtain the resistivity values of the LT layer that are in agreement with experimental results. It is concluded that the transient capacitance observed corresponds to the resistance-capacitance time constant due to the LT-layer. In addition, the value of the activation energy is explained based on the equivalent circuit.Item type:Item, Observation of a dominant EL2-like mid-gap trap in In0.12Ga0.88As/GaAs superlattice grown at low temperature by molecular beam epitaxy(1999-11-01) ;Chen, JF ;Wang, PY ;Wang, JS ;Wong, HZ電子物理學系Admittance spectroscopy is used to study a low-temperature (LT)-grown relaxed In0.12Ga0.88As/GaAs p-i-n superlattice. The capacitance-frequency spectra show two step-like trapping effects which are explained by the existence of two traps (E-a = 0.73 eV, sigma = 4.6 x 10(-11) cm(2) and E-a = 0.75 eV, sigma = 3.7 x 10(-15) cm(2)) in the LT-grown superlattice region. These two traps are the dominating defects observed in deep-level transient spectroscopy with one being a majority trap and the other being a minority trap. The emission parameters and photo-capacitance quenching effect for the 0.75 eV trap agree with those known for EL2 defects, suggesting that the EL2 defect is strongly enhanced in InGaAs/GaAs by LT growth.Item type:Item, Capacitance dispersion in n-LT-i-p GaAs structures with the low-temperature layers grown at different temperatures(1999-12-01) ;Chen, JF ;Chen, NC ;Wang, PY ;Wang, JSWeng, CMThe electrical properties of annealed low-temperature GaAs are studied by investigating the frequency-dependent capacitance of n-LT-i-p structures with the low-temperature (LT) layers grown at different temperatures. Relative to the sample grown at 610 degrees C, the samples grown at 200, 300 and 400 degrees C show significant capacitance dispersions over frequency which is explained by the emission of carriers from traps. Based on a proposed band diagram where a dominating trap at 0.66-0.74 eV exists in the LT layers, the high-frequency dispersion is shown to be affected by resistance-capacitance (RC) time constant effects. From the mid-frequency capacitance versus voltage characteristics, the concentrations of the occupied traps are estimated to be approximate to 10(17) cm(-3) for samples grown at 200, 300 and 400 degrees C, which are found to be consistent with those obtained from analyzing the current-voltage characteristics of n(+)-LT-n(+) structures.