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dc.contributor.authorSha, D. Y.en_US
dc.contributor.authorHsu, Sheng-Yuanen_US
dc.contributor.authorLai, X. D.en_US
dc.date.accessioned2014-12-08T15:13:02Z-
dc.date.available2014-12-08T15:13:02Z-
dc.date.issued2007-12-01en_US
dc.identifier.issn0268-3768en_US
dc.identifier.urihttp://dx.doi.org/10.1007/s00170-006-0723-zen_US
dc.identifier.urihttp://hdl.handle.net/11536/10053-
dc.description.abstractIn wafer fabrication processes, batch processing accounts for over 30% of the overall processing time. And it's a trade-off between machine utilization and wafer waiting time. Therefore, batch machines have become one of the constraint resources during wafer fabrication. How to maintain the utilization and reduce the waiting time are important tasks for production control. Plenty of research in the past several years focused on the dispatching rules of batch processing. According to many researchers, look-ahead batch dispatching rules outperform MBS on waiting times and machine utilization. The look-ahead batching rules that have been developed are DBH, NACH, MCR, and DJAH. However, these rules do not take the due-date information of wafers into consideration, and can't accelerate the wafer's fabrication that will not be completed before the due-date. This study will develop a due-date oriented look-ahead batching rule, namely LBCR, that considers the due-date and expects to raise delivery rates and reduce the average tardiness. Firstly, this study will modify those batching rules to fit the manufacturing environment of wafer fabrication. There are serial simulation tests on those batching rules under various kinds of factors in terms of environment, including traffic intensity, product numbers and product mix rate. Finally, this study will compare the five batching rules on different performance indicators. After the simulation and statistic analysis undertaken, LBCR does outperform other batch dispatching rules on due-date related performance indicators, such as tardy rate and average tardiness.en_US
dc.language.isoen_USen_US
dc.subjectbatching ruleen_US
dc.subjectsimulationen_US
dc.subjectwafer fabricationen_US
dc.titleDesign of due-date oriented look-ahead batching rule in wafer fabricationen_US
dc.typeArticleen_US
dc.identifier.doi10.1007/s00170-006-0723-zen_US
dc.identifier.journalINTERNATIONAL JOURNAL OF ADVANCED MANUFACTURING TECHNOLOGYen_US
dc.citation.volume35en_US
dc.citation.issue5-6en_US
dc.citation.spage596en_US
dc.citation.epage609en_US
dc.contributor.department工業工程與管理學系zh_TW
dc.contributor.departmentDepartment of Industrial Engineering and Managementen_US
dc.identifier.wosnumberWOS:000250836200016-
dc.citation.woscount5-
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