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dc.contributor.authorHuang, Shyh-Jeren_US
dc.contributor.authorYen, Shun-Tungen_US
dc.date.accessioned2014-12-08T15:13:05Z-
dc.date.available2014-12-08T15:13:05Z-
dc.date.issued2007-12-01en_US
dc.identifier.issn0021-8979en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2818366en_US
dc.identifier.urihttp://hdl.handle.net/11536/10096-
dc.description.abstractThe optical properties of modulation-doped InGaN/GaN laser diodes are theoretically studied with the effects of electron spillover from quantum wells considered. We use a six-band model including the strain effect for calculating valence band states. The continuous subbands are treated by a dense discretization for the electrons spilling from the quantum wells. The calculation results show that the threshold current can be significantly reduced by p-type modulation doping around the wells but not by n-type doping, supposed that the layers are of a perfect quality and the impurity-induced defects are ignored. Also, the p-type modulation doping can make the threshold current more insensitive to the cavity loss compared with other cases. An optimized threshold current density can be achieved for single-quantum-well lasers by introducing p-type dopants. However, the dopant concentration is high and may be inaccessible. For double-quantum-well lasers an optimized low threshold current can be achieved with a slighter and practicable p-type doping level. (C) 2007 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.titleImprovement in threshold of InGaN/GaN quantum-well lasers by p-type modulation dopingen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2818366en_US
dc.identifier.journalJOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume102en_US
dc.citation.issue11en_US
dc.citation.epageen_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000251678800004-
dc.citation.woscount2-
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