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dc.contributor.author謝宗雍en_US
dc.contributor.authorHSIEH TSUNG-EONGen_US
dc.date.accessioned2014-12-13T10:48:01Z-
dc.date.available2014-12-13T10:48:01Z-
dc.date.issued2014en_US
dc.identifier.govdocMOST103-2221-E009-057-MY2zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/101222-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=8357761&docId=447534en_US
dc.description.sponsorship科技部zh_TW
dc.language.isozh_TWen_US
dc.title低維度硫族合金之電遷移與擴散行為研究zh_TW
dc.titleA Study of Electromigration and Diffusion Behaviors of Low-Dimensional Chalcogenidesen_US
dc.typePlanen_US
dc.contributor.department國立交通大學材料科學與工程學系(所)zh_TW
Appears in Collections:Research Plans