化學機械研磨在氧化鋁及氮化鎵上的應用研究

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DC Field	Value	Language
dc.contributor.author	施敏	en_US
dc.contributor.author	SZE SIMON MIN	en_US
dc.date.accessioned	2014-12-13T10:49:25Z	-
dc.date.available	2014-12-13T10:49:25Z	-
dc.date.issued	2000	en_US
dc.identifier.govdoc	NSC89-2215-E009-039	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/101637	-
dc.identifier.uri	https://www.grb.gov.tw/search/planDetail?id=542138&docId=99592	en_US
dc.description.sponsorship	行政院國家科學委員會	zh_TW
dc.language.iso	zh_TW	en_US
dc.subject	化學機械研磨	zh_TW
dc.subject	氮化鎵	zh_TW
dc.subject	單晶基板	zh_TW
dc.subject	Chemical mechanical polish	en_US
dc.subject	GaN	en_US
dc.subject	Single crystal substrate	en_US
dc.title	化學機械研磨在氧化鋁及氮化鎵上的應用研究	zh_TW
dc.title	The Application Research of Chemical Mechanical Polished on Al/sub 2/O/sub 3/ and GaN	en_US
dc.type	Plan	en_US
dc.contributor.department	交通大學電子工程系	zh_TW
Appears in Collections:	Research Plans

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