完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | 余沛慈 | en_US |
dc.contributor.author | Yu Peichen | en_US |
dc.date.accessioned | 2014-12-13T10:49:40Z | - |
dc.date.available | 2014-12-13T10:49:40Z | - |
dc.date.issued | 2009 | en_US |
dc.identifier.govdoc | NSC98-2221-E009-111-MY2 | zh_TW |
dc.identifier.uri | http://hdl.handle.net/11536/101732 | - |
dc.identifier.uri | https://www.grb.gov.tw/search/planDetail?id=1903573&docId=315423 | en_US |
dc.description.sponsorship | 行政院國家科學委員會 | zh_TW |
dc.language.iso | zh_TW | en_US |
dc.title | 新穎反向式微影技術應用於CMOS 32奈米節點及其以下之光學鄰近修正術(OPC)與可製造性設計(DFM) | zh_TW |
dc.title | Inverse Lithography Solution for Optical Proximity Correction and Design for Manufacturing for CMOS 32nm Node and beyond | en_US |
dc.type | Plan | en_US |
dc.contributor.department | 國立交通大學光電工程學系(所) | zh_TW |
顯示於類別: | 研究計畫 |