完整後設資料紀錄
DC 欄位語言
dc.contributor.author周景揚en_US
dc.contributor.authorJOU JING-YANGen_US
dc.date.accessioned2014-12-13T10:51:03Z-
dc.date.available2014-12-13T10:51:03Z-
dc.date.issued2008en_US
dc.identifier.govdocNSC97-2220-E009-031zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/102509-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=1688357&docId=291156en_US
dc.description.abstract半導體元件尺寸隨著製程的持續進步而逐年縮小,可整合於單一晶片上的電晶體數 量也因此增加,讓當今的電子產品得已提供更多、更複雜的功能。然而,在進入深次微 米時代後,製程上的變異及物理效應對於晶片的影響也愈來愈顯著,使得晶片設計面臨 許多新的挑戰,在設計的各個環節上更需重視先進製程可能發生的問題,方能提昇晶片 的品質及可製造性。 本計畫針對設計深次微米時代所需的技術,以分項方式個別研發新興電子設計自動 化軟體,總計畫則以協調各子計畫的相關成果,整合為一由上而下之完整解決方案。所 涵蓋之六項子計畫如下:符合次世代晶片上通訊思維之具備幾何考量的系統架構合成技 術(子計畫一)、整合性低耗電管理之技術開發(子計畫二)、角落錯誤之矽除錯(子計畫 三)、應用計算智慧推理處理後深次微米時代電路設計上的可靠度挑戰(子計畫四)、考慮 可製造化、可靠度與良率的繞線系統(子計畫五)、及後佈局階段貫穿點及導線良率改善 技術之研究(子計畫六)。這些完整而深入的技術開發,預期可以適切地解決這些深次微 米時代所衍生的問題,同時提高國內半導體相關產業之競爭力。zh_TW
dc.description.abstractAs semiconductor devices shrink with the advancing process technology, more and more transistors can be integrated in a single chip. It makes modern electronic products provide much more functionalities, and increases the complexity to design a chip as well. In addition, the impact of process variation during manufacturing and other physical effects become more and more significant and non-negligible in the era of deep submicron (DSM). New challenges and new design issues arise along with the DSM. Therefore designers must resolve these issues by considering all design stages simultaneously to increase the quality and manufacturability of chips. Because the DSM issues and targets of different design levels are quite diverse, this project considers the overall design flow and divides it into six major topics for advanced research: (1) Geometry-Aware Architecture Synthesis for Next-Generation On-Chip Communication Paradigm, (2) Integrated Low Power Management Technologies, (3) Silicon Debug for Hard-Corner Design Errors, (4) Coping with Reliability Challenges to Circuit Designs beyond Deep Sub-Micron Era by Computational Intelligence Reasoning, (5) Manufacturability, Reliability, and Yield-Aware Routing System, and (6) Yield-Preferred Redundant Via and Wire Insertion with Critical Area Analysis in Post-Layout Stage. The ultimate goal of this project is to integrate these emerging EDA technologies as a complete top-down solution. The techniques developed by these proposed sub-projects will efficiently solve the DSM issues. Furthermore, with the benefit of better design quality and faster design process, the domestic semiconductor related industry will have better competitiveness.en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subject深次微米zh_TW
dc.subject電子設計自動化zh_TW
dc.subject多時脈週期通訊zh_TW
dc.subject高階合成zh_TW
dc.subject耗電管理zh_TW
dc.subject節能設計zh_TW
dc.subject矽晶片除錯zh_TW
dc.subject除錯化設計zh_TW
dc.subject軟性錯誤zh_TW
dc.subject計算智能zh_TW
dc.subject可製造性設計zh_TW
dc.subject多餘貫穿點zh_TW
dc.subjectDeep Submicronen_US
dc.subjectElectronics Design Automationen_US
dc.subjectMuti-CycleCommunicationen_US
dc.subjectHigh-Level Synthesisen_US
dc.subjectPower Managementen_US
dc.subjectLow Power Designen_US
dc.subjectSilicon Debugen_US
dc.subjectDesign for Debugen_US
dc.subjectSoft Erroren_US
dc.subjectComputational Intelligenceen_US
dc.subjectDesign forManufacturabilityen_US
dc.subjectRedundant Viaen_US
dc.title後次微米時代新興電子設計自動化技術之研究---總計畫(I)zh_TW
dc.titleEmerging EDA Technologies beyond DSM Eraen_US
dc.typePlanen_US
dc.contributor.department國立交通大學電子工程學系及電子研究所zh_TW
顯示於類別:研究計畫