| 標題: | 12吋矽晶圓半導體VCD製程設備及BST介電薄膜成長研究---總計畫(I) Research and Development of CVD Process Equipment for a 12-Inch Single Silicon Wafer and Growth of BST Dielectric Thin Film (I) |
| 作者: | 林清發 LIN TSING-FA 交通大學機械工程系 |
| 關鍵字: | CVD反應爐;薄膜成長;熱流設計;矽晶圓;CVD reactor;Thin film growth;Thermel fluid design;Silicon wafer |
| 公開日期: | 2000 |
| 官方說明文件#: | NSC89-2212-E009-037 |
| URI: | http://hdl.handle.net/11536/103100 https://www.grb.gov.tw/search/planDetail?id=501199&docId=90359 |
| Appears in Collections: | Research Plans |
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