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dc.contributor.author徐桂珠en_US
dc.contributor.author陳啟昌en_US
dc.contributor.author詹佳樺en_US
dc.contributor.author賴暎杰en_US
dc.date.accessioned2014-12-16T06:12:35Z-
dc.date.available2014-12-16T06:12:35Z-
dc.date.issued2010-11-16en_US
dc.identifier.govdocG01D005/38zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/103678-
dc.description.abstract一種位移量測系統,包括一同調光源、一二維光柵、一光感測器及一訊號處理裝置。當同調光入射至二維光柵後,產生一零階光束及多個一階繞射光束。零階光束與其中的兩個一階繞射光束在光感測器上形成不同方向的干涉條紋。因此,當二維光柵移動時,位移量測系統藉由計算不同方向的干涉條紋之相位差,而獲得二維光柵於對應方向上的位移量。此外,當二維光柵旋轉時,位移量測系統藉由一階繞射光束之繞射圖形的旋轉角度,而獲得二維光柵的旋轉量。zh_TW
dc.language.isozh_TWen_US
dc.title位移量測系統及其方法zh_TW
dc.typePatentsen_US
dc.citation.patentcountryTWNzh_TW
dc.citation.patentnumber201040504zh_TW
Appears in Collections:Patents


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