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dc.contributor.authorWu YewChung Sermonen_US
dc.contributor.authorChang Tai-Minen_US
dc.contributor.authorChiu Yu Chiaen_US
dc.contributor.authorHu Jen-Lien_US
dc.date.accessioned2014-12-16T06:13:49Z-
dc.date.available2014-12-16T06:13:49Z-
dc.date.issued2014-08-05en_US
dc.identifier.govdocH01L021/00zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/104358-
dc.description.abstractThe present invention related to a method for manufacturing a thermal dissipation substrate and a thermal dissipation substrate. The method includes steps of: (a) providing a substrate body having a surface; (b) forming a plurality of concave regions on the surface; and (c) filling the plurality of concave regions with a plurality of diamond materials. The thermal dissipation substrate includes: a substrate having a surface at a first horizontal; a plurality of regions formed on the surface at a second horizontal; and a plurality of diamond materials having a relatively high thermal coefficient and disposed on the plurality of regions.zh_TW
dc.language.isozh_TWen_US
dc.titleThermal dissipation substratezh_TW
dc.typePatentsen_US
dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber08796071zh_TW
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