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dc.contributor.authorYang Hao-Ien_US
dc.contributor.authorChuang Ching-Teen_US
dc.contributor.authorHwang Weien_US
dc.date.accessioned2014-12-16T06:14:04Z-
dc.date.available2014-12-16T06:14:04Z-
dc.date.issued2013-02-26en_US
dc.identifier.govdocG11C005/14zh_TW
dc.identifier.govdocG11C011/00zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/104504-
dc.description.abstractThe present invention proposes a gate oxide breakdown-withstanding power switch structure, which is connected with an SRAM and comprises a first CMOS switch and a second CMOS switch respectively having different gate-oxide thicknesses or different threshold voltages. The CMOS switch, which has a normal gate-oxide thickness or a normal threshold voltage, provides current for the SRAM to wake up the SRAM from a standby or sleep mode to an active mode. The CMOS switch, which has a thicker gate-oxide thickness or a higher threshold voltage, provides current for the SRAM to work in an active mode. The present invention prevents a power switch from gate-oxide breakdown lest noise margin, stabilization and performance of SRAM be affected.zh_TW
dc.language.isozh_TWen_US
dc.titleGate oxide breakdown-withstanding power switch structurezh_TW
dc.typePatentsen_US
dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber08385149zh_TW
Appears in Collections:Patents


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