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dc.contributor.authorTsengen_US
dc.contributor.authorTseung-Yuenen_US
dc.contributor.authorLeeen_US
dc.contributor.authorShean Yiahen_US
dc.date.accessioned2014-12-16T06:14:35Z-
dc.date.available2014-12-16T06:14:35Z-
dc.date.issued2006-03-21en_US
dc.identifier.govdocH01L029/76zh_TW
dc.identifier.govdocH01L021/02zh_TW
dc.identifier.govdocH01L027/108zh_TW
dc.identifier.govdocH01L029/94zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/104821-
dc.description.abstractA ferroelectric memory structure is disclosed. The ferroelectric memory structure includes a substrate, an insulating layer formed on the substrate, a plurality of oxide electrodes formed on the insulating layer, a ferroelectric layer formed on the insulating layer and the plurality of oxide electrodes, and a plurality of metallic electrodes formed on the ferroelectric layer and corresponding to the plurality of the oxide electrodes.zh_TW
dc.language.isozh_TWen_US
dc.titleFerroelectric memory structure and fabrication method thereofzh_TW
dc.typePatentsen_US
dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber07015523zh_TW
Appears in Collections:Patents


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