完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Shyu, Deh-Ming | en_US |
dc.contributor.author | Lu, Mao-Hong | en_US |
dc.contributor.author | Ko, Chun-Hung | en_US |
dc.date.accessioned | 2014-12-08T15:13:35Z | - |
dc.date.available | 2014-12-08T15:13:35Z | - |
dc.date.issued | 2007-08-01 | en_US |
dc.identifier.issn | 0030-4018 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1016/j.optcom.2007.04.001 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/10491 | - |
dc.description.abstract | Through-focus focus-metric is a method that is used to analyze images on a fixed plane with the help of focus-metric values when the target moves through the focus. In this study, an optical microscope having a magnification of 250x is constructed. A two-pitch grating target is imaged on a CCD detector and through-focus image data are measured. In addition, the optical field on the CCD detector is simulated using the boundary element method and physical optics propagation. By comparing the measured focus-metric signatures with the simulated signatures, information regarding the linewidth is obtained. The results show that the through-focus focus-metric method is a very sensitive method that can be used for measuring parameters such as the linewidth. Thus, a nanoscale resolution can be achieved. (C) 2007 Elsevier B.V. All rights reserved. | en_US |
dc.language.iso | en_US | en_US |
dc.title | High-resolution through-focus metric with two-pitch grating target | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1016/j.optcom.2007.04.001 | en_US |
dc.identifier.journal | OPTICS COMMUNICATIONS | en_US |
dc.citation.volume | 276 | en_US |
dc.citation.issue | 1 | en_US |
dc.citation.spage | 31 | en_US |
dc.citation.epage | 36 | en_US |
dc.contributor.department | 光電工程學系 | zh_TW |
dc.contributor.department | Department of Photonics | en_US |
dc.identifier.wosnumber | WOS:000247749900004 | - |
dc.citation.woscount | 1 | - |
顯示於類別: | 期刊論文 |