標題: | Highly sensitive focus monitoring on production wafer by scatterometry measurements for 90/65-nm node devices |
作者: | Kawachi, Toshihide Fudo, Hidekimi Iwata, Yoshio Matsumoto, Shunichi Sasazawa, Hideaki Mori, Tadayoshi 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
關鍵字: | focusing;photolithography;resists;scatterometry |
公開日期: | 1-八月-2007 |
摘要: | High performance analog (HPA) CMOS devices with multiple threshold voltages have been successfully fabricated in a 0.13-mu m logic-based mixed-signal CMOS process on a single chip. The HPA devices demonstrate superior drivability, dc gain, matching, and reliability using an optimized halo and lightly doped drain (LLD) engineering approach combined with a unique dual gate oxide module for aggressive gate oxide thickness scaling. |
URI: | http://dx.doi.org/10.1109/TSM.2007.901831 http://hdl.handle.net/11536/4296 |
ISSN: | 0894-6507 |
DOI: | 10.1109/TSM.2007.901831 |
期刊: | IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING |
Volume: | 20 |
Issue: | 3 |
起始頁: | 222 |
結束頁: | 231 |
顯示於類別: | 會議論文 |