標題: Visualization of vortex flow patterns with a uniformly perforated showerhead in a model lamp heat, single-wafer thermal processor
作者: Cheng, Tsung Chieh
Lin, Tsing Fa
Yang, Jung Yen
Jian, Sheng-Rui
機械工程學系
電子物理學系
Department of Mechanical Engineering
Department of Electrophysics
關鍵字: buoyancy induced flow;mixed flow;plug flow;rapid thermal process
公開日期: 1-八月-2007
摘要: Following the rapid progress in the growth of semiconductor thin crystal films, rapid thermal (RT) CVD not only allows for minimization of processing and cycle time, but also enables a significant reduction in the thermal budget. The flow recirculation in the processing chamber driven by the large buoyancy resulting from the temperature differences between the wafer and input gases is known to produce detrimental effects on the film properties. In this study, the proposed 8" rapid thermal processor (RTP) with a showerhead inlet contains three basic types of flow patterns (plug, mixed, and buoyancy-induced flow). The physical parameters, gas flow rate, and pressure of processing chamber are investigated in detail.
URI: http://dx.doi.org/10.1002/cvde.200606566
http://hdl.handle.net/11536/10509
ISSN: 0948-1907
DOI: 10.1002/cvde.200606566
期刊: CHEMICAL VAPOR DEPOSITION
Volume: 13
Issue: 8
起始頁: 427
結束頁: 432
顯示於類別:期刊論文


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