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dc.contributor.authorHui-Ru Jiangen_US
dc.contributor.authorHua-Yu Changen_US
dc.contributor.authorChang Chih-Longen_US
dc.date.accessioned2014-12-16T06:15:16Z-
dc.date.available2014-12-16T06:15:16Z-
dc.date.issued2012-03-08en_US
dc.identifier.govdocG06F017/50zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/105203-
dc.description.abstractA method for designing wiring topology for electromigration avoidance, which is composed of multiple sources, multiple sinks and multiple wires, is disclosed. The steps of said method to get an optimal topology includes: 1. calculating the length of all the wires to choose one of the wires with the shortest length as a feasible wire, 2. deciding a capacity of the feasible wire, 3. deciding the capacities of the other wire according to the capacity of the feasible wire, a flow of the source of the feasible wire and a flow of the sink of the feasible wire, 4. comparing the length of the other wires to select another feasible wire, 5. repeating said steps until finding all feasible wires for constructing a feasible topology, 6. creating a flow network according to the feasible topology, 7. iteratively checking if a negative cycle exists in the flow network and removing it until no more negative cycles.zh_TW
dc.language.isozh_TWen_US
dc.titleMethod for designing wiring topology for electromigration avoidance and fabrication method of integrate circuits including said methodzh_TW
dc.typePatentsen_US
dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber20120060137zh_TW
Appears in Collections:Patents


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