標題: Liquid crystal alignment on the a-C : H films by Ar plasma ion immersion
作者: Chang, S. J.
Wu, K. Y.
Yang, Y. H.
Hwang, J.
Wu, Hsin-Ying
Pan, Ru-Pin
Lee, A. P.
Kou, C. S.
電子物理學系
Department of Electrophysics
關鍵字: liquid crystal alignment;amorphous carbon;plasma ion;x-ray photoemission
公開日期: 31-七月-2007
摘要: A plasma ion immersion treatment has been developed to enhance the liquid crystal (LC) alignment on the hydrogenated amorphous carbon (a-C:H) layer in an inductively coupled plasma (ICP) chamber. No LC alignment was observed for the a-C:H layer tilted at an angle of 0 degrees during the bombardment with plasma ions. The LC alignment occurs for the a-C:H layer tilted at an angle of 30 degrees or 60 degrees. Their pretilt angles (similar to 1.4 degrees) are approximately the same. The azimuthal anchoring strength is 1.98 x 10(-6) J/m(2) at a tilted angle of 30 degrees and 1.14 x 10(-4) J/m(2) at a tilted angle of 60 degrees. The mechanism for the LC alignment is attributed to the oblique incidence of ions within the matrix sheath of non-uniform thickness near the a-C: H surface under a negative pulse bias. The matrix sheath of non-uniform thickness is confirmed by the plasma density distribution in the ICP chamber and the X-ray photoemission spectra across the a-C:H layer. (C) 2007 Elsevier B.V. All rights reserved.
URI: http://dx.doi.org/10.1016/j.tsf.2007.04.039
http://hdl.handle.net/11536/10534
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2007.04.039
期刊: THIN SOLID FILMS
Volume: 515
Issue: 20-21
起始頁: 8000
結束頁: 8004
顯示於類別:期刊論文


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