標題: | Liquid crystal alignment on the a-C : H films by Ar plasma ion immersion |
作者: | Chang, S. J. Wu, K. Y. Yang, Y. H. Hwang, J. Wu, Hsin-Ying Pan, Ru-Pin Lee, A. P. Kou, C. S. 電子物理學系 Department of Electrophysics |
關鍵字: | liquid crystal alignment;amorphous carbon;plasma ion;x-ray photoemission |
公開日期: | 31-Jul-2007 |
摘要: | A plasma ion immersion treatment has been developed to enhance the liquid crystal (LC) alignment on the hydrogenated amorphous carbon (a-C:H) layer in an inductively coupled plasma (ICP) chamber. No LC alignment was observed for the a-C:H layer tilted at an angle of 0 degrees during the bombardment with plasma ions. The LC alignment occurs for the a-C:H layer tilted at an angle of 30 degrees or 60 degrees. Their pretilt angles (similar to 1.4 degrees) are approximately the same. The azimuthal anchoring strength is 1.98 x 10(-6) J/m(2) at a tilted angle of 30 degrees and 1.14 x 10(-4) J/m(2) at a tilted angle of 60 degrees. The mechanism for the LC alignment is attributed to the oblique incidence of ions within the matrix sheath of non-uniform thickness near the a-C: H surface under a negative pulse bias. The matrix sheath of non-uniform thickness is confirmed by the plasma density distribution in the ICP chamber and the X-ray photoemission spectra across the a-C:H layer. (C) 2007 Elsevier B.V. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.tsf.2007.04.039 http://hdl.handle.net/11536/10534 |
ISSN: | 0040-6090 |
DOI: | 10.1016/j.tsf.2007.04.039 |
期刊: | THIN SOLID FILMS |
Volume: | 515 |
Issue: | 20-21 |
起始頁: | 8000 |
結束頁: | 8004 |
Appears in Collections: | Articles |
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