Nanostructured thin-film formed by utilizing oblique-angle deposition and method of the same

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DC 欄位	值	語言
dc.contributor.author	Chang, Chia-Hua	en_US
dc.contributor.author	Yang, Chin-Sheng	en_US
dc.contributor.author	Chiu, Ching-Hua	en_US
dc.contributor.author	Yu, Pei-Chen	en_US
dc.contributor.author	Kuo, Hao-Chung	en_US
dc.date.accessioned	2014-12-16T06:15:42Z	-
dc.date.available	2014-12-16T06:15:42Z	-
dc.date.issued	2010-02-18	en_US
dc.identifier.govdoc	B32B003/26	zh_TW
dc.identifier.govdoc	C23C014/30	zh_TW
dc.identifier.govdoc	C23C014/34	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/105443	-
dc.description.abstract	The present invention discloses a transparent conductive nanostructured thin-film by oblique-angle deposition and method of the same. An electron beam system is utilized to evaporate the target source. Evaporation substrate is disposed on a plurality of adjustable sample stage. Multiple gas control valve and heat source is provided to control the gas flow and temperature within the process chamber. An annealing process is performed after the evaporation to improve the thin-film structure and optoelectronic properties.	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	Nanostructured thin-film formed by utilizing oblique-angle deposition and method of the same	zh_TW
dc.type	Patents	en_US
dc.citation.patentcountry	USA	zh_TW
dc.citation.patentnumber	20100040859	zh_TW
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