Plasma device for liquid crystal alignment

完整後設資料紀錄

DC 欄位	值	語言
dc.contributor.author	Chao, Ru-Pin	en_US
dc.contributor.author	Wu, Hsin-Ying	en_US
dc.contributor.author	Wang, Chih-Chieh	en_US
dc.contributor.author	Chang, Shao-Ju	en_US
dc.contributor.author	Hwang, Jenn-Chang	en_US
dc.contributor.author	Kou, Chwung-Shan	en_US
dc.contributor.author	Wu, Kuen-Yi	en_US
dc.contributor.author	Lee, An-Ping	en_US
dc.contributor.author	Wei, Hsiao-Kuan	en_US
dc.date.accessioned	2014-12-16T06:15:57Z	-
dc.date.available	2014-12-16T06:15:57Z	-
dc.date.issued	2008-06-05	en_US
dc.identifier.govdoc	H05H001/46	zh_TW
dc.identifier.uri	http://hdl.handle.net/11536/105596	-
dc.description.abstract	A device utilizes a plasma for a liquid crystal alignment. The alignment is processed in a vacuum chamber in a simple way. A general chemical vapor deposition is coordinated to reduce cost. The present invention is a novel contactless process avoiding particle contamination, residual static charge and scratch. And multiple are as of the present invention can be used for alignment.	zh_TW
dc.language.iso	zh_TW	en_US
dc.title	Plasma device for liquid crystal alignment	zh_TW
dc.type	Patents	en_US
dc.citation.patentcountry	USA	zh_TW
dc.citation.patentnumber	20080129207	zh_TW
顯示於類別：	專利資料

文件中的檔案：

若為 zip 檔案，請下載檔案解壓縮後，用瀏覽器開啟資料夾中的 index.html 瀏覽全文。