Title: | Method for manufacturing a combined solid immersion lens (SIL) and submicron aperture, and device thereof |
Authors: | Wensyang, Hsu Hsueh, Chou Chung, Tien |
Issue Date: | 15-Jul-2004 |
Abstract: | The invention relates to an integrated method for manufacturing a combined solid immersion lens (SIL) and submicron aperture, and device thereof, comprising depositing a sacrificial layer on a substrate, coating a photoresist on the sacrificial layer and using photo-lithography to form an aperture on the photoresist, applying reflow and etching process to remove the sacrificial layer below the aperture, depositing a conductive material on the photoresist and performing electroplating to reduce the aperture size, then coating another photoresist and using photo-lithography to form a cylindrical phtoresist above the aperture, applying a high temperature thermal reflow to form a microlens, and finally removing the substrate to obtain an optical read/write apparatus with a combined solid immersion lens (SIL) and submicron aperture. |
Gov't Doc #: | G02B003/02 G02B013/18 |
URI: | http://hdl.handle.net/11536/105773 |
Patent Country: | USA |
Patent Number: | 20040136091 |
Appears in Collections: | Patents |
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