標題: | Method for manufacturing a combined solid immersion lens (SIL) and submicron aperture, and device thereof |
作者: | Hsu Wensyang Chou Hsueh Liang Tien Chung Hao |
公開日期: | 26-十月-2004 |
摘要: | The invention relates to an integrated method for manufacturing a combined solid immersion lens (SIL) and submicron aperture, and device thereof, comprising depositing a sacrificial layer on a substrate, coating a photoresist on the sacrificial layer and using photo-lithography to form an aperture on the photoresist, applying reflow and etching process to remove the sacrificial layer below the aperture, depositing a conductive material on the photoresist and performing electroplating to reduce the aperture size, then coating another photoresist and using photo-lithography to form a cylindrical phtoresist above the aperture, applying a high temperature thermal reflow to form a microlens, and finally removing the substrate to obtain an optical read/write apparatus with a combined solid immersion lens (SIL) and submicron aperture. |
官方說明文件#: | H01J040/14 H01J003/14 H01J005/16 G02B003/02 G02B013/18 G02B003/00 G02B007/00 G02B009/00 G02B011/00 G02B013/00 G02B015/00 G02B017/00 G02B025/00 G11B007/00 G11B007/135 G11B011/00 G03F001/00 G03F007/00 |
URI: | http://hdl.handle.net/11536/104840 |
專利國: | USA |
專利號碼: | 06809886 |
顯示於類別: | 專利資料 |