標題: Method for manufacturing a combined solid immersion lens (SIL) and submicron aperture, and device thereof
作者: Hsu
Wensyang
Chou
Hsueh Liang
Tien
Chung Hao
公開日期: 26-Oct-2004
摘要: The invention relates to an integrated method for manufacturing a combined solid immersion lens (SIL) and submicron aperture, and device thereof, comprising depositing a sacrificial layer on a substrate, coating a photoresist on the sacrificial layer and using photo-lithography to form an aperture on the photoresist, applying reflow and etching process to remove the sacrificial layer below the aperture, depositing a conductive material on the photoresist and performing electroplating to reduce the aperture size, then coating another photoresist and using photo-lithography to form a cylindrical phtoresist above the aperture, applying a high temperature thermal reflow to form a microlens, and finally removing the substrate to obtain an optical read/write apparatus with a combined solid immersion lens (SIL) and submicron aperture.
官方說明文件#: H01J040/14
H01J003/14
H01J005/16
G02B003/02
G02B013/18
G02B003/00
G02B007/00
G02B009/00
G02B011/00
G02B013/00
G02B015/00
G02B017/00
G02B025/00
G11B007/00
G11B007/135
G11B011/00
G03F001/00
G03F007/00
URI: http://hdl.handle.net/11536/104840
專利國: USA
專利號碼: 06809886
Appears in Collections:Patents


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