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dc.contributor.authorWensyang, Hsuen_US
dc.contributor.authorHsueh, Chouen_US
dc.contributor.authorChung, Tienen_US
dc.date.accessioned2014-12-16T06:16:19Z-
dc.date.available2014-12-16T06:16:19Z-
dc.date.issued2004-07-15en_US
dc.identifier.govdocG02B003/02zh_TW
dc.identifier.govdocG02B013/18zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/105773-
dc.description.abstractThe invention relates to an integrated method for manufacturing a combined solid immersion lens (SIL) and submicron aperture, and device thereof, comprising depositing a sacrificial layer on a substrate, coating a photoresist on the sacrificial layer and using photo-lithography to form an aperture on the photoresist, applying reflow and etching process to remove the sacrificial layer below the aperture, depositing a conductive material on the photoresist and performing electroplating to reduce the aperture size, then coating another photoresist and using photo-lithography to form a cylindrical phtoresist above the aperture, applying a high temperature thermal reflow to form a microlens, and finally removing the substrate to obtain an optical read/write apparatus with a combined solid immersion lens (SIL) and submicron aperture.zh_TW
dc.language.isozh_TWen_US
dc.titleMethod for manufacturing a combined solid immersion lens (SIL) and submicron aperture, and device thereofzh_TW
dc.typePatentsen_US
dc.citation.patentcountryUSAzh_TW
dc.citation.patentnumber20040136091zh_TW
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