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dc.contributor.authorChang, Kow-Mingen_US
dc.contributor.authorChao, Kuo-Yien_US
dc.contributor.authorChou, Ting-Weien_US
dc.contributor.authorChang, Chin-Tienen_US
dc.date.accessioned2014-12-08T15:13:42Z-
dc.date.available2014-12-08T15:13:42Z-
dc.date.issued2007-07-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.46.4333en_US
dc.identifier.urihttp://hdl.handle.net/11536/10607-
dc.description.abstractIn this study. the zirconium oxide (ZrO2) membrane has been successfully applied as a pH-sensitive layer for ion-sensitive field-effect transistors (ISFETs). It exhibited an excellent response range of 56.7-58.3 mV/pH from the fixed current measurement using HP4156A. The ZrO2 membrane prepared by direct current (DC) sputtering was used as a pH-sensitive film that showed good surface adsorption with oxide and silicon. The pH sensitivities slightly decreased in 1 M NaCl solution; however. the device showed a perfect linear response of 52.5 mV/pH. The linear pH sensitivity response was measured between pH 1 to 13 in a buffer solution that was provided by Riedel-deHan.en_US
dc.language.isoen_USen_US
dc.subjectZrO2en_US
dc.subjectISFETen_US
dc.subjectdriften_US
dc.subjectpHen_US
dc.subjectsensitivityen_US
dc.subjectMOSFETen_US
dc.titleCharacteristics of zirconium oxide gate ion-sensitive field-effect transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.46.4333en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume46en_US
dc.citation.issue7Aen_US
dc.citation.spage4333en_US
dc.citation.epage4337en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000248237100069-
dc.citation.woscount8-
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