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dc.contributor.authorYang, Kai-Mingen_US
dc.contributor.authorChung, Jen-Yangen_US
dc.contributor.authorHsieh, Ming-Fengen_US
dc.contributor.authorLin, Deng-Sungen_US
dc.date.accessioned2014-12-08T15:13:43Z-
dc.date.available2014-12-08T15:13:43Z-
dc.date.issued2007-07-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.46.4395en_US
dc.identifier.urihttp://hdl.handle.net/11536/10609-
dc.description.abstractThe topographic height measurement on a sample consisting of domains of different materials in noncontact atomic force microscopy (NC-AFM) is typically incorrect owing to the variation in electrostatic force between a tip and a sample. The tip-sample electrostatic force is owing to the difference in effective contact potential between a tip and a sample. This study demonstrates that the error in height strongly depends on the bias applied between the tip and the sample, the radius of the tip apex. the work function difference, and the frequency shift. Experimental results are well explained by integrated model calculations and by including the van der Waals and electrostatic forces between the tip and the sample in the analysis. When the simultaneous compensation of contact potentials during imaging is not performed, the errors occurring in the height measurement can be estimated from the tip-sample distance vs the bias curves obtained in situ.en_US
dc.language.isoen_USen_US
dc.titleApparent topographic height variations measured by noncontact atomic force microscopyen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.46.4395en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERSen_US
dc.citation.volume46en_US
dc.citation.issue7Aen_US
dc.citation.spage4395en_US
dc.citation.epage4402en_US
dc.contributor.department物理研究所zh_TW
dc.contributor.departmentInstitute of Physicsen_US
dc.identifier.wosnumberWOS:000248237100081-
dc.citation.woscount6-
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