標題: | Automatic-Patterned Sapphire Substrate Nanometrology Using Atomic Force Microscope |
作者: | Hung, Shao-Kang Cheng, Chiao-Hua Chen, Cheng-Lung 機械工程學系 Department of Mechanical Engineering |
關鍵字: | Atomic force microscopy;pattern recognition;sapphire;measurement system data handling;image analysis |
公開日期: | 1-三月-2015 |
摘要: | Light emitting diodes become brighter because of the contribution of patterned sapphire substrates (PSS). The dimensions of PSS crucially affect its performance. The most suitable instrument to measure PSS is atomic force microscope, which provides three-dimensional surface profiles. This paper proposes an automatic method to analyze AFM-collected raw data and produce characteristic parameters of PSS, including height, diameters, pitch, and side angles. Experimental results show that this method has good repeatability of 1.2 and 6.3 nm on measuring height and bottom diameter, respectively. This nanometrology method will be extensively applicable for similar nanostructures with periodic patterns. |
URI: | http://dx.doi.org/10.1109/TNANO.2015.2392128 http://hdl.handle.net/11536/124544 |
ISSN: | 1536-125X |
DOI: | 10.1109/TNANO.2015.2392128 |
期刊: | IEEE TRANSACTIONS ON NANOTECHNOLOGY |
Volume: | 14 |
起始頁: | 292 |
結束頁: | 296 |
顯示於類別: | 期刊論文 |