標題: Automatic-Patterned Sapphire Substrate Nanometrology Using Atomic Force Microscope
作者: Hung, Shao-Kang
Cheng, Chiao-Hua
Chen, Cheng-Lung
機械工程學系
Department of Mechanical Engineering
關鍵字: Atomic force microscopy;pattern recognition;sapphire;measurement system data handling;image analysis
公開日期: 1-Mar-2015
摘要: Light emitting diodes become brighter because of the contribution of patterned sapphire substrates (PSS). The dimensions of PSS crucially affect its performance. The most suitable instrument to measure PSS is atomic force microscope, which provides three-dimensional surface profiles. This paper proposes an automatic method to analyze AFM-collected raw data and produce characteristic parameters of PSS, including height, diameters, pitch, and side angles. Experimental results show that this method has good repeatability of 1.2 and 6.3 nm on measuring height and bottom diameter, respectively. This nanometrology method will be extensively applicable for similar nanostructures with periodic patterns.
URI: http://dx.doi.org/10.1109/TNANO.2015.2392128
http://hdl.handle.net/11536/124544
ISSN: 1536-125X
DOI: 10.1109/TNANO.2015.2392128
期刊: IEEE TRANSACTIONS ON NANOTECHNOLOGY
Volume: 14
起始頁: 292
結束頁: 296
Appears in Collections:Articles