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dc.contributor.authorTien, C. H.en_US
dc.contributor.authorHung, C. H.en_US
dc.date.accessioned2014-12-08T15:13:46Z-
dc.date.available2014-12-08T15:13:46Z-
dc.date.issued2007-07-01en_US
dc.identifier.issn1041-1135en_US
dc.identifier.urihttp://dx.doi.org/10.1109/LPT.2007.900080en_US
dc.identifier.urihttp://hdl.handle.net/11536/10638-
dc.description.abstractIn this letter, we propose the optomechanical design and fabrication of a novel batched-processed polarization beam splitter (PBS) with an adjustable leak ratio for optical recording applications. The micro-PBS was fabricated by a 410-nm low stress silicon nitride Si3N4 membrane integrated with a bimorph actuator. A de drive voltage was applied to allow an adjustable leak ratio (0-0.24) with incident angle from 65 degrees to 75 degrees for operation in the different optical requirements (phase-change and magneto-optical disks) at lambda = 633 nm. The characteristics of the fabricated PBS are in close agreement with the theoretical calculations and confirm its feasibility.en_US
dc.language.isoen_USen_US
dc.subjectintegrated opticsen_US
dc.subjectmicroelectromechanical systems (MEMS)en_US
dc.subjectoptical componentsen_US
dc.subjectoptical device fabricationen_US
dc.titleMicromachined polarization beam splitter with adjustable leak ratio for optical pickupen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/LPT.2007.900080en_US
dc.identifier.journalIEEE PHOTONICS TECHNOLOGY LETTERSen_US
dc.citation.volume19en_US
dc.citation.issue13-16en_US
dc.citation.spage1109en_US
dc.citation.epage1111en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000248671600051-
dc.citation.woscount1-
Appears in Collections:Articles


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