Title: | 半導體製程之對準標記 |
Authors: | 李承士 張翼 |
Issue Date: | 11-Apr-2003 |
Abstract: | 本創作半導體製程之對準標記,該對準標記具備X、Y兩方向游標尺及半圓游標尺,且該對準標記係由主刻度與次刻度所組成;藉由本創作進行光罩對準校正,毋需多次的對準、曝光、顯影、檢驗誤差之繁瑣流程,僅需一次的對準操作即可以將前後道光罩偏差量控制在0.1μm,完成精確的光罩對準。 |
Gov't Doc #: | H01L023/544 H01L023/544 |
URI: | http://hdl.handle.net/11536/106465 |
Patent Country: | TWN |
Patent Number: | 00528204 |
Appears in Collections: | Patents |
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