標題: | The resistive switching characteristics of a Ti/Gd(2)O(3)/Pt RRAM device |
作者: | Liu, Kou-Chen Tzeng, Wen-Hsien Chang, Kow-Ming Chan, Yi-Chun Kuo, Chun-Chih Cheng, Chun-Wen 電子工程學系及電子研究所 Department of Electronics Engineering and Institute of Electronics |
公開日期: | 1-五月-2010 |
摘要: | We successfully fabricated the Gd(2)O(3) film for the application of resistive random access memory (RRAM). The resistive switching behavior of the Ti/Gd(2)O(3)/Pt capacitor structure could be both operated under positive or negative bias. However, there was a significant difference on the switching properties. The switching behavior under positive bias operation was more stable, had less voltage and resistance fluctuation, and had longer endurance than that of the negative one. We propose that the anode electrode plays an important role in the switching characteristics and may be the cause of the asymmetry of the I-V curves between positive and negative operation. (C) 2010 Elsevier Ltd. All rights reserved. |
URI: | http://dx.doi.org/10.1016/j.microrel.2010.02.006 http://hdl.handle.net/11536/10677 |
ISSN: | 0026-2714 |
DOI: | 10.1016/j.microrel.2010.02.006 |
期刊: | MICROELECTRONICS RELIABILITY |
Volume: | 50 |
Issue: | 5 |
起始頁: | 670 |
結束頁: | 673 |
顯示於類別: | 會議論文 |