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dc.contributor.authorLin, Jia-Chuanen_US
dc.contributor.authorYang, Po-Yuen_US
dc.contributor.authorTsai, Wei-Chihen_US
dc.date.accessioned2014-12-08T15:14:47Z-
dc.date.available2014-12-08T15:14:47Z-
dc.date.issued2007-02-01en_US
dc.identifier.issn0026-2692en_US
dc.identifier.urihttp://dx.doi.org/10.1016/j.mejo.2006.11.004en_US
dc.identifier.urihttp://hdl.handle.net/11536/11166-
dc.description.abstractIn this paper, the metamorphic high electron mobility transistors (mHEMTs) are investigated numerically and compared with pseudomorphic high electron mobility transistors (pHEMTs). The two-dimensional device simulator, MEDICI, is used to solve the Poisson's equation and the electron/hole current continuity equations. The influences of delta-doping concentration and position, gate width, spacer thickness, etc. on the performances of HEMTs are explored. It shows clearly that mHEMTs have higher transconductances, drain currents and DC voltage swings than pHEMTs. (c) 2006 Elsevier Ltd. All rights reserved.en_US
dc.language.isoen_USen_US
dc.subjecthigh electron mobility transistoren_US
dc.subjectmetamorphic high electron mobility transistoren_US
dc.subjectpseudo morphic high electron mobility transistoren_US
dc.subjectdelta-dopingen_US
dc.subjectMEDICIen_US
dc.titleSimulation and analysis of metamorphic high electron mobility transistorsen_US
dc.typeArticleen_US
dc.identifier.doi10.1016/j.mejo.2006.11.004en_US
dc.identifier.journalMICROELECTRONICS JOURNALen_US
dc.citation.volume38en_US
dc.citation.issue2en_US
dc.citation.spage251en_US
dc.citation.epage254en_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000244589900017-
dc.citation.woscount4-
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