完整後設資料紀錄
DC 欄位 | 值 | 語言 |
---|---|---|
dc.contributor.author | Yang, Ching-Jung | en_US |
dc.contributor.author | Wang, Shun-Min | en_US |
dc.contributor.author | Liang, Shih-Wei | en_US |
dc.contributor.author | Chang, Yung-Huang | en_US |
dc.contributor.author | Chen, Chih | en_US |
dc.contributor.author | Shieh, Jia-Min | en_US |
dc.date.accessioned | 2014-12-08T15:14:52Z | - |
dc.date.available | 2014-12-08T15:14:52Z | - |
dc.date.issued | 2007-01-15 | en_US |
dc.identifier.issn | 0003-6951 | en_US |
dc.identifier.uri | http://dx.doi.org/10.1063/1.2431786 | en_US |
dc.identifier.uri | http://hdl.handle.net/11536/11222 | - |
dc.description.abstract | Low-temperature growth of self-organized ZnO nanorods on Si substrate is achieved using anodic aluminum oxide and atomic layer deposition at 250 degrees C without catalyst or seed layer. Photoluminescence spectrum indicates that the ZnO nanorod arrays exhibit a blue/green luminescence at 480 nm. In addition, the nanorod arrays demonstrate excellent field-emission properties with a turn-on electric field of 6.5 V mu m(-1) and a threshold electric field of 9.8 V mu m(-1), which are attributed to the perfectly perpendicular alignment of ZnO nanorods to the Si substrate. (c) 2007 American Institute of Physics. | en_US |
dc.language.iso | en_US | en_US |
dc.title | Low-temperature growth of ZnO nanorods in anodic aluminum oxide on Si substrate by atomic layer deposition | en_US |
dc.type | Article | en_US |
dc.identifier.doi | 10.1063/1.2431786 | en_US |
dc.identifier.journal | APPLIED PHYSICS LETTERS | en_US |
dc.citation.volume | 90 | en_US |
dc.citation.issue | 3 | en_US |
dc.citation.epage | en_US | |
dc.contributor.department | 材料科學與工程學系 | zh_TW |
dc.contributor.department | Department of Materials Science and Engineering | en_US |
dc.identifier.wosnumber | WOS:000243582400070 | - |
dc.citation.woscount | 48 | - |
顯示於類別: | 期刊論文 |