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dc.contributor.authorYin, Gung-Chianen_US
dc.contributor.authorSong, Yen-Fangen_US
dc.contributor.authorTang, Mau-Tsuen_US
dc.contributor.authorChen, Fu-Rongen_US
dc.contributor.authorLiang, Keng S.en_US
dc.contributor.authorDuewer, Frederick W.en_US
dc.contributor.authorFeser, Michaelen_US
dc.contributor.authorYun, Wenbingen_US
dc.contributor.authorShieh, Han-Ping D.en_US
dc.date.accessioned2014-12-08T15:15:21Z-
dc.date.available2014-12-08T15:15:21Z-
dc.date.issued2006-11-27en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2397483en_US
dc.identifier.urihttp://hdl.handle.net/11536/11519-
dc.description.abstractA hard x-ray transmission microscope with 30 nm spatial resolution has been developed employing the third diffraction order of a zone plate objective. The microscope utilizes a capillary type condenser with suitable surface figure to generate a hollow cone illumination which is matched in illumination range to the numerical aperture of the third order diffraction of a zone plate with an outmost zone width of 50 nm. Using a test sample of a 150 nm thick gold spoke pattern with finest half-pitch of 30 nm, the authors obtained x-ray images with 30 nm resolution at 8 keV x-ray energy. (c) 2006 American Institute of Physics.en_US
dc.language.isoen_USen_US
dc.title30 nm resolution x-ray imaging at 8 keV using third order diffraction of a zone plate lens objective in a transmission microscopeen_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2397483en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume89en_US
dc.citation.issue22en_US
dc.citation.epageen_US
dc.contributor.department光電工程學系zh_TW
dc.contributor.department顯示科技研究所zh_TW
dc.contributor.departmentDepartment of Photonicsen_US
dc.contributor.departmentInstitute of Displayen_US
dc.identifier.wosnumberWOS:000242538500022-
dc.citation.woscount64-
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