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dc.contributor.authorGuo, Jyh-Chyurnen_US
dc.contributor.authorLin, Yi-Minen_US
dc.date.accessioned2014-12-08T15:15:32Z-
dc.date.available2014-12-08T15:15:32Z-
dc.date.issued2006-11-01en_US
dc.identifier.issn0018-9480en_US
dc.identifier.urihttp://dx.doi.org/10.1109/TMTT.2006.883654en_US
dc.identifier.urihttp://hdl.handle.net/11536/11628-
dc.description.abstractA lossy substrate model is developed to accurately simulate the measured RF noise of 80-nm super-100-GHz f(T) n-MOSFETs. A substrate RLC network built in the model plays a key role responsible for the nonlinear frequency response of noise in 1-18-GHz regime, which did not follow the typical thermal noise theory. Good match with the measured S-parameters, Y-parameters, and noise parameters before deembedding proves the lossy substrate model. The intrinsic RF noise can be extracted easily and precisely by the lossy substrate deembedding using circuit simulation. The accuracy has been justified by good agreement in terms of I-d, g(m), Y-parameters, and f(T) under a wide range of bias conditions and operating frequencies. Both channel thermal noise and resistance induced excess noises have been implemented in simulation. A white noise gamma factor extracted to be higher than 2/3 accounts for the velocity saturation and channel length modulation effects. The extracted intrinsic NFmin as low as 0.6-0.7 d at 10 GHz indicates the advantages of super-100 GHz f(T) offered by the sub-100-nm multifinger n-MOSFETs. The frequency dependence of noise resistance R-n suggests the bulk RC coupling induced excess channel thermal noise apparent in 1-10-GHz regime. The study provides useful guideline for low noise and low power design by using sub-100-nm RF CMOS technology.en_US
dc.language.isoen_USen_US
dc.subjectlossy substrateen_US
dc.subjectnoiseen_US
dc.subjectRF CNIOSen_US
dc.subjectRLC networken_US
dc.titleA new lossy substrate model for accurate RF CMOS noise extraction and simulation with frequency and bias dependenceen_US
dc.typeArticleen_US
dc.identifier.doi10.1109/TMTT.2006.883654en_US
dc.identifier.journalIEEE TRANSACTIONS ON MICROWAVE THEORY AND TECHNIQUESen_US
dc.citation.volume54en_US
dc.citation.issue11en_US
dc.citation.spage3975en_US
dc.citation.epage3985en_US
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000242185700021-
dc.citation.woscount4-
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