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dc.contributor.authorChiu, S. H.en_US
dc.contributor.authorChen, Chihen_US
dc.contributor.authorYao, D. J.en_US
dc.date.accessioned2014-12-08T15:15:51Z-
dc.date.available2014-12-08T15:15:51Z-
dc.date.issued2006-09-01en_US
dc.identifier.issn0361-5235en_US
dc.identifier.urihttp://hdl.handle.net/11536/11832-
dc.description.abstractThe effect of Al-trace dimension on electromigration of flip-chip solder joints was investigated. The Al trace dimension was found to have a significant influence on the electromigration failure time. When joints with Al traces 100 mu m wide were stressed by 1.0 A at 100 degrees C, failure times were 35 h, 1,700 h, and > 3,000 h for joints with Al traces that were 2,550 mu m, 1,700 mu m, and 850 mu m long, respectively. Solder joints with Al traces 40 mu m wide and 2,550 mu m long failed instantly at 0.6 A. The Joule heating effect was found to be responsible for the huge difference in failure time.en_US
dc.language.isoen_USen_US
dc.subjectelectromigrationen_US
dc.subjectflip chipen_US
dc.subjectJoule heatingen_US
dc.titleEffect of al trace dimension on electromigration failure time of flip-chip solder jointsen_US
dc.typeArticleen_US
dc.identifier.journalJOURNAL OF ELECTRONIC MATERIALSen_US
dc.citation.volume35en_US
dc.citation.issue9en_US
dc.citation.spage1740en_US
dc.citation.epage1744en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000240529900010-
dc.citation.woscount3-
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