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dc.contributor.authorChu, Li-Hsinen_US
dc.contributor.authorHsu, Heng-Tungen_US
dc.contributor.authorChang, Edward-Yien_US
dc.contributor.authorLee, Tser-Lungen_US
dc.contributor.authorChen, Sze-Hungen_US
dc.contributor.authorLien, Yi-Chungen_US
dc.contributor.authorChang, Chun-Yenen_US
dc.date.accessioned2014-12-08T15:15:58Z-
dc.date.available2014-12-08T15:15:58Z-
dc.date.issued2006-09-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.45.L932en_US
dc.identifier.urihttp://hdl.handle.net/11536/11887-
dc.description.abstractA high linearity and high efficiency enhancement-mode InGaP/AlGaAs/InGaAs pseudomorphic high electron mobility transistor (PHEMT) for single supply operation has been developed. The low voltage operation is achieved by the very low knee voltage of the device and the linearity is improved by the optimizing concentrations of the two 3 delta-doped layers. Biased at drain-to-source voltage V-DS = 2V, the fabricated 0.5 x 200 mu m(2) device exhibited a maximum transconductance of 448 mS/mm. The measured minimum noise figure (NFmin) was 0.86 dB with 12.21 dB associated gain at 10 GHz. The device shows a high output third-order intercept point (OIP3)-P-1dB of 13.2 dB and a high power efficiency of 35% when under wideband code-division multiple-access (W-CDMA) modulation signal.en_US
dc.language.isoen_USen_US
dc.subjectenhancement-modeen_US
dc.subjectInGaPen_US
dc.subjectPHEMTen_US
dc.subjecthigh linearityen_US
dc.subjectOIP3en_US
dc.titleDouble delta-doped enhancement-mode InGaP/AlGaAs/InGaAs pseudomorphic high electron mobility transistor for linearity applicationen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.45.L932en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERSen_US
dc.citation.volume45en_US
dc.citation.issue33-36en_US
dc.citation.spageL932en_US
dc.citation.epageL934en_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.department電子工程學系及電子研究所zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.contributor.departmentDepartment of Electronics Engineering and Institute of Electronicsen_US
dc.identifier.wosnumberWOS:000241065100021-
dc.citation.woscount1-
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