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dc.contributor.authorLee, Linoen_US
dc.contributor.authorKu, Ching-Shunen_US
dc.contributor.authorKe, Wen-Chengen_US
dc.contributor.authorHo, Chih-Weien_US
dc.contributor.authorHuang, Huai-Yingen_US
dc.contributor.authorLee, Ming-Chihen_US
dc.contributor.authorChen, Wen-Hsiungen_US
dc.contributor.authorChou, Wu-Chinen_US
dc.contributor.authorChen, Wei-Kuoen_US
dc.date.accessioned2014-12-08T15:16:07Z-
dc.date.available2014-12-08T15:16:07Z-
dc.date.issued2006-08-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.45.L817en_US
dc.identifier.urihttp://hdl.handle.net/11536/11951-
dc.description.abstractCurrent conduction behavior on GaN V-defect was studied comprehensively using conductive atomic force microscopy. Experimental results indicate that the forward current in the V-defect region is at least three-order higher than that at surrounding area. On the other hand, a snowflake-like leakage current pattern was observed in the V-defect owing to the ease of current breakdown at the crest lines and perimeters. Further static current-voltage measurement suggests that the current flow is governed by Schottky emission and Fowler-Nordheim tunneling for V-defect region and surrounding area, respectively.en_US
dc.language.isoen_USen_US
dc.subjectGaNen_US
dc.subjectV-defecten_US
dc.subjectCAFMen_US
dc.subjectFowler-Nordheim tunnelingen_US
dc.subjectSchottkyen_US
dc.titleCurrent properties of GaNV-defect using conductive atomic force microscopyen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.45.L817en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERSen_US
dc.citation.volume45en_US
dc.citation.issue29-32en_US
dc.citation.spageL817en_US
dc.citation.epageL820en_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000240294900022-
dc.citation.woscount4-
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