標題: | Variation of Electrostatic Discharge Robustness Induced by the Surface Morphology of High Power Light-Emitting Diodes |
作者: | Yang, Shih Chun Lin, Pang Fu, Han Kuei Wang, Chien Ping Chen, Tzung Te Lee, An Tse Huang, Sheng Bang Chu, Mu Tao 材料科學與工程學系 Department of Materials Science and Engineering |
公開日期: | 1-五月-2010 |
摘要: | The capability of high-power nitride-based light-emitting diodes (HPLED) to withstand electrostatic discharge (ESD) is very important key index due to the horizontal structure of the insulating property of the sapphire substrate. Accordingly, the investigation of ESD failure mechanisms is a beneficial topic. However, it is difficult to real-time monitor the damage caused by the ESD stress because it occurred in a very short period. Before the series ESD stress, atomic force microcopy (AFM) and conductive AFM (C-AFM) were applied to explore the correlation between surface morphology and electrical properties of LED chips. Furthermore, after the series ESD stress, transmission electron microscopy (TEM) was used to investigate the failure modes and compare to the distribution of the surface current observed by C-AFM. These findings suggest that the V-shaped defect and surface morphology are strong correlate to the endurance of ESD stress. (c) 2010 The Japan Society of Applied Physics |
URI: | http://dx.doi.org/10.1143/JJAP.49.056602 http://hdl.handle.net/11536/5441 |
ISSN: | 0021-4922 |
DOI: | 10.1143/JJAP.49.056602 |
期刊: | JAPANESE JOURNAL OF APPLIED PHYSICS |
Volume: | 49 |
Issue: | 5 |
結束頁: | |
顯示於類別: | 期刊論文 |