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dc.contributor.authorYang, Shih Chunen_US
dc.contributor.authorLin, Pangen_US
dc.contributor.authorFu, Han Kueien_US
dc.contributor.authorWang, Chien Pingen_US
dc.contributor.authorChen, Tzung Teen_US
dc.contributor.authorLee, An Tseen_US
dc.contributor.authorHuang, Sheng Bangen_US
dc.contributor.authorChu, Mu Taoen_US
dc.date.accessioned2014-12-08T15:06:57Z-
dc.date.available2014-12-08T15:06:57Z-
dc.date.issued2010-05-01en_US
dc.identifier.issn0021-4922en_US
dc.identifier.urihttp://dx.doi.org/10.1143/JJAP.49.056602en_US
dc.identifier.urihttp://hdl.handle.net/11536/5441-
dc.description.abstractThe capability of high-power nitride-based light-emitting diodes (HPLED) to withstand electrostatic discharge (ESD) is very important key index due to the horizontal structure of the insulating property of the sapphire substrate. Accordingly, the investigation of ESD failure mechanisms is a beneficial topic. However, it is difficult to real-time monitor the damage caused by the ESD stress because it occurred in a very short period. Before the series ESD stress, atomic force microcopy (AFM) and conductive AFM (C-AFM) were applied to explore the correlation between surface morphology and electrical properties of LED chips. Furthermore, after the series ESD stress, transmission electron microscopy (TEM) was used to investigate the failure modes and compare to the distribution of the surface current observed by C-AFM. These findings suggest that the V-shaped defect and surface morphology are strong correlate to the endurance of ESD stress. (c) 2010 The Japan Society of Applied Physicsen_US
dc.language.isoen_USen_US
dc.titleVariation of Electrostatic Discharge Robustness Induced by the Surface Morphology of High Power Light-Emitting Diodesen_US
dc.typeArticleen_US
dc.identifier.doi10.1143/JJAP.49.056602en_US
dc.identifier.journalJAPANESE JOURNAL OF APPLIED PHYSICSen_US
dc.citation.volume49en_US
dc.citation.issue5en_US
dc.citation.epageen_US
dc.contributor.department材料科學與工程學系zh_TW
dc.contributor.departmentDepartment of Materials Science and Engineeringen_US
dc.identifier.wosnumberWOS:000277998700061-
dc.citation.woscount3-
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