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dc.contributor.authorHsieh, Tung-Poen_US
dc.contributor.authorChiu, Pei-Chinen_US
dc.contributor.authorChyi, Jen-Innen_US
dc.contributor.authorChang, Hsiang-Szuen_US
dc.contributor.authorChen, Wen-Yenen_US
dc.contributor.authorHsu, Tzu Minen_US
dc.contributor.authorChang, Wen-Haoen_US
dc.date.accessioned2014-12-08T15:16:10Z-
dc.date.available2014-12-08T15:16:10Z-
dc.date.issued2006-07-31en_US
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://dx.doi.org/10.1063/1.2245374en_US
dc.identifier.urihttp://hdl.handle.net/11536/11999-
dc.description.abstractThe authors report an effective way to enhance the optical efficiency of InAs quantum dots (QDs) on GaAs emitting at the wavelength of 1.5 mu m. It is found that the loss of holes from QDs to their proximity via the high indium composition InGaAs overgrown layer, which is necessary for achieving long wavelength emission, is the origin of photoluminescence intensity degradation at high temperature. Inserting a 4 nm thick Al0.45Ga0.55As layer, acting as a carrier blocking layer, into the GaAs capping matrix can improve the room temperature photoluminescence peak intensity by five and two times for the ground and first excited states, respectively.en_US
dc.language.isoen_USen_US
dc.titleEnhancing luminescence efficiency of InAs quantum dots at 1.5 mu m using a carrier blocking layeren_US
dc.typeArticleen_US
dc.identifier.doi10.1063/1.2245374en_US
dc.identifier.journalAPPLIED PHYSICS LETTERSen_US
dc.citation.volume89en_US
dc.citation.issue5en_US
dc.citation.epageen_US
dc.contributor.department電子物理學系zh_TW
dc.contributor.departmentDepartment of Electrophysicsen_US
dc.identifier.wosnumberWOS:000239520200082-
dc.citation.woscount5-
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