The effects of plasma treatment on the thermal stability of HfAlOx thin films

Full metadata record

DC Field	Value	Language
dc.contributor.author	Chang, Kow-Ming	en_US
dc.contributor.author	Chen, Bwo-Ning	en_US
dc.contributor.author	Huang, Shih-Ming	en_US
dc.date.accessioned	2014-12-08T15:16:13Z	-
dc.date.available	2014-12-08T15:16:13Z	-
dc.date.issued	2007	en_US
dc.identifier.isbn	978-1-4244-1891-6	en_US
dc.identifier.uri	http://hdl.handle.net/11536/12045	-
dc.language.iso	en_US	en_US
dc.title	The effects of plasma treatment on the thermal stability of HfAlOx thin films	en_US
dc.type	Proceedings Paper	en_US
dc.identifier.journal	2007 INTERNATIONAL SEMICONDUCTOR DEVICE RESEARCH SYMPOSIUM, VOLS 1 AND 2	en_US
dc.citation.spage	181	en_US
dc.citation.epage	182	en_US
dc.contributor.department	電子工程學系及電子研究所	zh_TW
dc.contributor.department	Department of Electronics Engineering and Institute of Electronics	en_US
dc.identifier.wosnumber	WOS:000255857100092	-
Appears in Collections:	Conferences Paper