標題: A dispatching rule for photolithography scheduling with an on-line rework strategy
作者: Sha, D. Y.
Hsu, S. Y.
Che, Z. H.
Chen, C. H.
工業工程與管理學系
Department of Industrial Engineering and Management
關鍵字: photolithography area;dispatching rule;on-line rework;finished proportion
公開日期: 1-七月-2006
摘要: Generally speaking, wafer fabrication factories define the photolithography area as the dispatching center of the entire factory. To establish a set of operative dispatching rules in the photolithography area while taking into consideration the rework of defective products would assist in coordinating and balancing the workload of the entire production line. Furthermore, it would help to enhance both the productivity and efficiency of the wafer fabrication, reduce the on-line WIP stock, shorten the production cycle time, and satisfy the requirements of customers regarding production due time and product quality. This research uses on-line rework as the basis for bringing the factor of reworking of a batch process into the dispatching rule for measurement. It then develops the dispatching rule (Rw-DR) which includes the rework strategy. In addition, this research focuses on the batch with high finished proportion in the photolithography area for finding a way to complete the manufacturing procedure faster, lighten the machine workload of the waiting line, and at the same time increase the output quantity. (c) 2006 Elsevier Ltd. All rights reserved.
URI: http://dx.doi.org/10.1016/j.cie.2006.04.002
http://hdl.handle.net/11536/12051
ISSN: 0360-8352
DOI: 10.1016/j.cie.2006.04.002
期刊: COMPUTERS & INDUSTRIAL ENGINEERING
Volume: 50
Issue: 3
起始頁: 233
結束頁: 247
顯示於類別:期刊論文


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