限制驅導排程方法在晶圓廠黃光區之應用

標題:	限制驅導排程方法在晶圓廠黃光區之應用 An Application of TOC for Photolithography Area in Wafer Fabrication Factory
作者:	李榮貴 LI RONG-KWEI 國立交通大學工業工程與管理學系
關鍵字:	晶圓製造;光刻術;限制理論;Wafer fabrication;Photolithography;Theory of constraint
公開日期:	2001
官方說明文件#:	NSC90-2218-E009-020
URI:	http://hdl.handle.net/11536/95153 https://www.grb.gov.tw/search/planDetail?id=674289&docId=128525
Appears in Collections:	Research Plans

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