晶圓製造廠黃光區派工法則之研究

Title:	晶圓製造廠黃光區派工法則之研究 A Study of Dispatching Rules for Photolithography Area in Wafer Fabrication Factories
Authors:	李慶恩交通大學工業工程與管理系
Keywords:	晶圓製造;黃光區;瓶頸;派工法則;Wafer fabrication;Photolithography area;Bottleneck;Dispatching rule
Issue Date:	1997
Gov't Doc #:	NSC86-2213-E009-001
URI:	http://hdl.handle.net/11536/95394 https://www.grb.gov.tw/search/planDetail?id=268639&docId=47816
Appears in Collections:	Research Plans

APA	李. (1997). 晶圓製造廠黃光區派工法則之研究. https://www.grb.gov.tw/search/planDetail?id=268639&docId=47816.
Bibtex	@article{1997, title={晶圓製造廠黃光區派工法則之研究}, author={李慶恩}, journal={https://www.grb.gov.tw/search/planDetail?id=268639&docId=47816}, year={1997}, url={https://ir.lib.nycu.edu.tw/handle/11536/95394}, }