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dc.contributor.author李慶恩en_US
dc.date.accessioned2014-12-13T10:38:27Z-
dc.date.available2014-12-13T10:38:27Z-
dc.date.issued1997en_US
dc.identifier.govdocNSC86-2213-E009-001zh_TW
dc.identifier.urihttp://hdl.handle.net/11536/95394-
dc.identifier.urihttps://www.grb.gov.tw/search/planDetail?id=268639&docId=47816en_US
dc.description.sponsorship行政院國家科學委員會zh_TW
dc.language.isozh_TWen_US
dc.subject晶圓製造zh_TW
dc.subject黃光區zh_TW
dc.subject瓶頸zh_TW
dc.subject派工法則zh_TW
dc.subjectWafer fabricationen_US
dc.subjectPhotolithography areaen_US
dc.subjectBottlenecken_US
dc.subjectDispatching ruleen_US
dc.title晶圓製造廠黃光區派工法則之研究zh_TW
dc.titleA Study of Dispatching Rules for Photolithography Area in Wafer Fabrication Factoriesen_US
dc.typePlanen_US
dc.contributor.department交通大學工業工程與管理系zh_TW
Appears in Collections:Research Plans